D. Zhong, COLORADO SCHOOL OF MINES, GOLDEN, CO; J. J. Moore, B. Mishra, Colorado School of Mines, Golden, CO; E. Levashov, MOSCOW INSTITUTE OF STEELS AND ALLOYS, MOSCOW, Russia; K. H. Kim, PUSAN NATIONAL UNIVERSITY, BUSAN, South Korea
Nanostructured PVD coatings in the Cr-N, Ni-Al-N, Ti-B-C-N, and Ti-Al-Si-N systems exhibit superior properties and have been tailored for specific engineering applications. These examples demonstrate that ion bombardment (ion energies and relative abundances of plasma species) of the substrate controls the relative amount of constituent phases of a nanocomposite and its crystallite size, and determines the microstructure (including crystal structure, interfacial structure, and grain structure) evolution during film growth. Through engineering the composition and microstructure, the desired relative density, mechanical, physical and chemical properties of the resulting film were obtained.
Summary: Nanostructured PVD coatings in the Cr-N, Ni-Al-N, Ti-B-C-N, and Ti-Al-Si-N systems exhibit superior properties and have been tailored for specific engineering applications. These examples demonstrate that ion bombardment of the substrate controls the relative amount of constituent phases of a nanocomposite and its crystallite size.
