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Wednesday, April 26, 2006 - 10:30 AM
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Thin Ti-Cu-Ni Brazing Filler Metal Plates Manufactured Using Electrolytic Deposition

V. Y. Kezik, n/a, Katzrin, Israel

There are substantial industrial needs in thin foil brazing filler metals for joining titanium structures such as heat exchangers and honeycombs. A new method of manufacturing thin, 100-200 μm thick Ti-Cu-Ni brazing filler metal plates is developed. The plates consist of three separate elemental Ti, Cu, Ni, etc. layers deposited electrolytically one after another. Each layer has a thickness that is proportional to the final average elemental weight fraction of a whole plate weight according to a set up filler metal composition formula. To avoid serious problems associated with titanium electrolytic deposition under conventional conditions the proposed method has the following new advantageous features:
  1. The cathode is made of ferromagnetic steel;
  2. The alternating current 0.002-1.5 A/cm2 is superimposed on this cathode in addition to a major direct electrolytic current.  The ac component create alternating magnetic field applied to the steel plate that assist to effective titanium deposition;
  3. Low frequency, 60-100 Hz mechanical vibrations are also applied to the cathode;
  4.  Each elemental layer is deposited separately in a bath with a specific electrolytic solution. 
The principal difference between the new process and the conventional one is a non-equilibrium regime of the titanium ion deposition proceeding with a high speed.   The produced multi-layered plates are easily separated from the cathode upon accomplishing the layer deposition.  The resulting plates have a strong, ductile non-porous structure and a complete absence of entrapped hydrogen. The plates were successfully used in brazing samples made of pure titanium. The obtained joints have tensile strength in the 110-180 MPa range.
                          

Summary: A new method of manufacturing thin, 100-200 μm thick Ti-Cu-Ni brazing filler metal plates is developed. The plates consist of three separate elemental Ti, Cu, Ni, etc. layers deposited electrolitically one after another. Each layer has a thickness that is proportional to the final average elemental weight fraction of a whole plate weight according to a set up filler metal composition formula. To avoid serious problems associated with titanium electrolytic deposition under conventional conditions the proposed method has the following new advantageous features: The principal difference between the new process and the conventional one is a non-equilibrium regime of the titanium ion deposition proceeding with a high speed. The produced multi-layered plates are easily separated from the cathode upon accomplishing the layer deposition. The resulting plates have a strong, ductile non-porous structure and a complete absence of entrapped hydrogen. The plates were successfully used in brazing samples made of pure titanium. The obtained joints have tensile strength in the 110-180 MPa range.