Advances in Metallographical Etching – Reproducibility, Objectivity and Full Control with ThEtching

Etching processes are crucial for the characterization, quantification, and classification of microstructures, not only in light microscopy but increasingly in scanning electron microscopy. In industrial practice, however, etching techniques often remain limited to a few "simple" structural etches. The challenges posed by increasingly complex microstructures combined with ever-tighter tolerances are pushing the boundaries of existing standard etchants. Additionally, there is a ubiquitous drive towards eliminating critical chemicals from laboratories.

Recent years have highlighted the significant potential of alternative etching methods, particularly color etchings. Yet, in many metallographic labs, etchings are performed in fume hoods without considering other environmental conditions. This can lead to a range of outcomes, from inhomogeneous etchings to lack of reproducibility, to outright failures. The development of ThEtching addresses these challenges by ensuring constant ambient conditions, maximum reproducibility, and especially in-situ observation. The patent-pending setup not only simplifies the etching process but also enables the systematic optimization of existing etchings and the development of new, adapted contrasts.

The presentation of the ThEtching machine will show latest developments, include concrete examples and potential applications, showcasing its value for industrial practice as well as for research and development departments. This approach promises to overcome the limitations of traditional etching methods, marking a significant advancement in materials science by providing more precise, environmentally friendly, and adaptable solutions for microstructure analysis.