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Wednesday, May 17, 2006 - 4:40 PM
APP12.2

Study on Thin Film Coating Depositions by Very Low Pressure Plasma Spraying

D. Klein, D. Sokolov, C. Coddet, University of Technology Belfort-Montbeliard, Belfort Cedex, France

  Low pressure plasma spraying is well established thin film deposition process. Nerveless the interests during last few years to this process growth increasly especially for the process with very low pressure that allow to approach for the similar conditions than for the PVD process.  The aim of this study is different investigations on the ceramic coatings development using the VLPPS elaborated in LERMPS Laboratory. The obtained coatings were investigated for morphological properties by optical and electronic microscopy systems and for mechanical properties by tribological measure and scratch test were carrying out.

Summary: The aim of this study is different investigations on the ceramic coatings development using the VLPPS elaborated in LERMPS Laboratory.