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Tuesday, May 15, 2007 - 11:50 AM

Fuzzy Logic Analysis of Alumina–Titania Deposition Yield During APS Processing

M. P. Planche, A. F. Kanta, C. Coddet, University of Technology Belfort-Montbeliard, Belfort Cedex, France; G. Montavon, SPCTS - UMR CNRS 6638, Faculty of Sciences, Limoges cedex, France

APS process prediction in require a global approach, taken into account interrelated non-linear relationships between average thickness deposited and process parameters. To predict deposition yield with power processing parameters (arc current intensity, hydrogen ratio and plasma mixture gas) permit to reduce the associated development costs. The knowledge of the interaction between process parameters plays a very important role in the optimization approach. This work intends to develop a model based on fuzzy logic concept. The model establishes the relationships between deposition yield and power process parameter on the base of the defining rules. The model permits to determine out the role and the effect of each power process parameters on the deposition yield. The modeling results are compared to the experimental ones. The specific case of the deposition of alumina-titania (Al2O3-TiO2) coatings was considered.

Summary: This work intends to develop a model based on fuzzy logic concept. The model establishes the relationships between deposition yield and power process parameter on the base of the defining rules. The model permits to determine out the role and the effect of each power process parameters on the deposition yield.