D. Klein, D. Sokolov, C. Verdy, C. Coddet, University of Technology Belfort-Montbeliard, Belfort Cedex, France; R. Bolot, University of Technology Belfort-Montbeliard, Belfort, France
Low Pressure Plasma Spraying is well established deposition process bringing numerous solutions to industrial problems. Typically the operating pressure variable from 300 mbars to few mbars however the inferior limit is not explored due to the technical and technological difficulties. Recent installation of VLPPS chamber in the LERMPS laboratory allowed reaching stable environmental pressure at the range from 1 to 10 mbar during plasma spraying.
In the present work thin metallic coatings were obtained by very low pressure plasma spraying at 1 mbar. Optimized spray conditions plasma parameters, substrate preparation, powder feed rate approved the PVD “likely” coating realisation by plasma spraying techniques.
Summary: In the present work thin metallic coatings were obtained by very low pressure plasma spraying at 1 mbar. Optimized spray conditions plasma parameters, substrate preparation, powder feed rate approved the PVD “likely” coating realisation by plasma spraying techniques.
