Effect of Processing Parameters on the Properties of Titanium Nitride by Gas Tunnel Type Plasma Reactive Spraying

Effect of Processing Parameters on the Properties of Titanium Nitride by Gas Tunnel Type Plasma Reactive Spraying

 

Akira Kobayashi ⁽¹⁾, Yasutaka Ando ⁽²⁾ , S. Yugeswaran⁽¹⁾

⁽¹⁾    Joining & Welding Research Institute, Osaka University, Osaka 567-0047, JAPAN

⁽²⁾       Ashikaga Institute of Technology, Tochigi 326-8558, JAPAN

 

Email: kobayasi@jwri.osaka-u.ac.jp

Abstract

Reactive plasma spraying is one of the unique features of gas tunnel type plasma spraying processes for fabricating ceramics coatings with high deposition rate. This study describes the experimental results concerning the effect of processing variables such as nitrogen flow rate and spraying distance on the formation of titanium nitride from in-flight pure titanium powder through reactive plasma spraying. The obtained results from X-ray diffraction pattern reveal that the volume fraction of titanium nitride in the coating increases while increasing nitrogen content in the plasma gas mixture and with increased spraying distance. The coatings microstructure existing in typical lamellae structures with different kind of splat morphologies with respect to nitrogen content.