Chemical Vapor Deposition: Fundamentals and Applications

Chemical vapor deposition (CVD) provides a relatively inexpensive, commercially viable avenue to synthesizing materials that are used in a wide range of technological applications.   CVD of films and coatings involves the chemical reaction of gases on or near a substrate surface. This deposition method can produce coatings with tightly controlled dimensions and novel structures. Furthermore, the non-line-of-sight-deposition capability of CVD facilitates the coating of complex-shaped mechanical components.  .  Additionally, CVD has proved to be an essential tool in the research and development of nanotubes, graphene, and nanocrystalline diamond.   This tutorial shall address the most fundamental aspects of CVD, and discuss applications where CVD processes are well-suited and applications where they are not.