Influence of Microstructure on Plasma Resistance of Ceramic Coating

Some sintered ceramics and ceramics coatings have been applied to plasma etching equipment in semiconductor manufacturing processes. These ceramics are used to prevent corrosion of the device material by plasma, and its structure is thought to have a great influence on the characteristics. In this study, an experiment using yttrium oxide sintered body was conducted, and the relationship between plasma resistance and crystal grain size and direction was clarified. On the presentation, superiority or inferiority compared to the sintered body or other coating films of the sprayed coating is discussed