Aerosol Spraying of Bismuth Vanadate for Hydrogen Technology

Monday, May 27, 2019: 14:30
Annex Hall/F201 (Pacifico Yokohama)
Ms. Charline Wolpert , Helmut Schmidt University, University of the Federal Armed Forces Hamburg, Hamburg, Germany
Dr. María Villa Vidaller , Helmut Schmidt University, University of the Federal Armed Forces Hamburg, Hamburg, Germany
Dr. Frank Gärtner , Helmut Schmidt University, University of the Federal Armed Forces Hamburg, Hamburg, Germany
Prof. T. Klassen , Helmut Schmidt University, University of the Federal Armed Forces Hamburg, Hamburg, Germany
Dr. Mauricio Schieda , Helmholtz-Zentrum Geesthacht, Geesthacht, Germany
Dr. Thomas Emmler , Helmholtz-Zentrum Geesthacht, Geesthacht, Germany
Dr. Jun Akedo , National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan
Dr. Kentaro Shinoda , National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan
Dense, nano-structured bismuth vanadate thin films were successfully deposited by Aerosol Deposition Method (AD) at room temperature. AD offers a low-cost alternative route for fabrication of photoactive thin film metal oxide coatings as no binders or sintering processes have to be applied A micron-sized bismuth vanadate powder was used to fabricate thin photoactive layers with thicknesses below 1 µm on FTO and titanium substrates. The thin films were photocatalytically active under solar light due to their nano-sized structure and thus resulting enlarged surface area and the exceptional band gap of bismuth vanadate which makes them ideal candidates for photoelectrochemical hydrogen production through water splitting. Obtained coatings were analysed in order to estimate adhesion properties, film thickness and morphology.
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