Aerosol Spraying of Bismuth Vanadate for Hydrogen Technology
Aerosol Spraying of Bismuth Vanadate for Hydrogen Technology
Monday, May 27, 2019: 14:30
Annex Hall/F201 (Pacifico Yokohama)
Dense, nano-structured bismuth vanadate thin films were successfully deposited by Aerosol
Deposition Method (AD) at room temperature. AD offers a low-cost alternative route for fabrication
of photoactive thin film metal oxide coatings as no binders or sintering processes have to be applied
A micron-sized bismuth vanadate powder was used to fabricate thin photoactive layers with
thicknesses below 1 µm on FTO and titanium substrates. The thin films were photocatalytically
active under solar light due to their nano-sized structure and thus resulting enlarged surface area
and the exceptional band gap of bismuth vanadate which makes them ideal candidates for
photoelectrochemical hydrogen production through water splitting. Obtained coatings were
analysed in order to estimate adhesion properties, film thickness and morphology.