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Monday, May 15, 2006 - 11:30 AM
FACT1.4

On the Development and Chemical, Physical and Mechanical Characterization of EA-PVD TiO2 Thin Film Deposited on Different Substrates

C. Giolli, U. Bardi, Università di Firenze, Firenze, France; G. Rizzi, Turbocoating SpA, Rubbiano di Solignano, Italy; A. Scrivani, S. Troglio, Turbocoating SpA, Rubbiano Solignano - PR -, Italy; A. Credi, A. Di Fabio, Università di Bologna, Bologna, Italy

In the recent most advanced industrial application an important role is played by the coatings, which could be applied on different substrates with the purpose to improve the superficial characteristics of the component where they are applied and in particular to give to the component itself new properties, which the structural substrate material could not guarantee. One of the most important characteristics requested by the surface would be the capability to clean the environment in contact with the surface itself.The research is therefore addressed to the studies of new materials and coatings which could act as catalyst for purification. To this purpose, one of the most promising material is titanium dioxide.
This paper addresses the development of a new deposition technique for Titanium Dioxide which could allow the deposition on different substrates and mainly on ceramic and refractory materials that find application in different field of applications such as building trade.
At this purpose a new methodology has been developed in order to deposit TiO2 photocatalitic coatings by electric arc-PVD, by evaporating metallic titanium in oxidixing  atmosphere on different substrate materials (cupper, stainless steel and ceramic).
The obtained TiO2 coatings have been characterized from the chemical point of view by means of X-rays photoelectron spectroscopy (XPS) and Secondary Ion Mass Spectrometry (SIMS) and from the crystallographic point of view by means of X-Rays Diffraction (XRD) and Raman spectroscopy. The results of characterization have been analysed and used in order to optimise the deposition parameters with the target to obtain homogenous and rich in anatase coatings. Finally the photocatalitic activity of the obtained coatings has been tested by using phenol as photodegradable molecule.
The PVD arc deposited coatings showed a good performance in term of photo degradation activity in 24 – 48 hours under UV lamp exposition.

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