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Wednesday, May 17, 2006 - 9:00 AM
TFC3.1

Characterization of Metallic Film Coating Depositions by Very Low Pressure Plasma Spraying

D. Klein, C. Coddet, University of Technology Belfort-Montbeliard, Belfort Cedex, France; D. Sokolov, C. Verdy, University of Technology Belfort-Montbeliard, Belfort, France

The aim of this study is to characterize the properties of metallic coatings using the VLPPS elaborated in LERMPS Laboratory. VLPPS system developed has been used to study the properties of copper doped by different metallic elements. In order we have developed a substrate with different temperatures. Thus, we have been able to study for numerous parameters of thermal spray the effect of the temperature on the coatings obtained. Also we have characterized the effect of the pressure on the different constituting used. Finally, we have studied the different structure crystalline in the coatings. The results allow determining the effects of pressure to elaborate mixed metallic coatings.

Summary: The aim of this study is to characterize the properties of metallic coatings using the VLPPS elaborated in LERMPS Laboratory.