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Tuesday, May 9, 2006 - 12:30 PM
MEM5.16

Crystallization of Amorphous Sputtered NiTi Thin Films

A. G. Ramirez, Yale University, New Haven, CT

Sputtered NiTi thin films are commonly deposited in an amorphous state and require a high-temperature annealing step to crystallize them.  Their crystallization process is driven by the kinetic interplay of both nucleation and growth, and their resulting microstructure dictates the martensitic transformation behavior and actuation properties.  In this paper, we present the full description of the individual contributions of nucleation and growth. Using in situ transmission electron microscopy heating methods with the Johnson-Mehl-Avrami-Kolmogorov (JMAK) theory, we are able to determine these key parameters. During heating, we observed and analyzed the microstructural development and found a correlation between the average grain size and temperature.

Summary: This paper will describe the development of microstructure during annealing captured by in situ transmission electron microscopy techniques. With these in situ techniques, the nucleation and growth rates have been determined and compared to theoretical models.