Influence of reactive magnetron sputtering process parameters on structural, mechanical and corrosion properties of hafnium dioxide thin films deposited on titanium alloy surface

Hafnium dioxide (HfO₂) thin film is characterized by high dielectric constant, large band-gap and relatively high thermal stability. However, it should be noted, that its properties strongly depend on the hafnium dioxide thin film structure (amorphous or polycrystalline), which depends on fabrication method. 

The fabrication of HfO₂ films can be achieved using one of deposition methods, i.e.: atomic layer deposition, reactive magnetron sputtering, plasma ion assisted deposition or laser ablation. Reactive magnetron sputtering is a low temperature deposition method which can be used for obtaining high quality thin films even on large area substrates. The method has also a number of other advantages including low cost manufacturing or capability for fabrication of thin oxide films from metallic target.

The purpose of this work was a careful analysis of the influence of deposition process parameters, like: position sample in the reactor chamber and plasma inducing method, on structural, mechanical and corrosion properties of HfO₂ thin films. Investigated hafnia thin films were characterized by means of  atomic force microscopy (AFM), scanning electron microscopy (SEM) and X-ray diffraction spectroscopy (XRD). Hardness of HfO2 thin films was characterized by means nanoindentaion metod and corrosion properties were determined by analysing the voltammetric curves.