Determination of structural, mechanical and corrosion properties of titanium dioxide thin films formed on Ti6Al4V surface by using magnetron sputtering processes (conventional and with modulated plasma)

Titanium oxide film is a very important material due to its multifunctional application in photocatalysis, hydrophobic material, photovoltaic cells, photochromic and electrochromic devices, gas sensor, biosensor, corrosion protection, bactericide, optical device, among others [1-4]. TiO₂ can occur in a number of crystalline forms, the most important of which are: anatase, rutile and brokite. Nowadays, it is one of the most extensive studied metal oxide, both as particulate and thin film form.

Technological process and its parameters, used to formation of TiO₂ thin films, directly effect on the crystalline phase, roughness, porosity and particle size and distribution.

The main goal of this work was to investigate the influence of reactive magnetron sputtering process parameter on structural, mechanical and corrosion properties of titanium dioxide thin films on titanium alloy. The titanium dioxide thin films were deposited on Ti6Al4V alloy surface using conventional magnetron sputtering process and so-called “magnetron sputtering with modulated plasma” process. The structural characteristics of the thin films obtained were examined using optical profilometry and AFM and SEM measurements. The mechanical properties were determined using nanoindentation measurements and corrosion properties were determined by analysing the voltammetric curves.