Advanced HIPIMS solution for R&D and Process Development

When HIPIMS was first introduced to the thin film coating industry, it was considered an advanced technique for production applications, which would provide optimal film properties and wear resistance. The HIPIMS supply options were very large scale directly suited to the production industry. However, it was found to have significant limitations in rate, which minimized its acceptance in production applications. Recently, the introduction of smaller scale supplies triggered an emergence of the technology into the R&D community. This enabled a high rate of enhancements and helped innovate a more efficient capability and process optimization that could be utilized by HIPIMS supplies. This ultimately re-energized the interest and potential of HIPIMS in the thin film coating industry. One of the solutions to emerge from the crowd was the IMPULSE supply, which brings a unique range of features and performance advantages to the HIPIMS community. Test results will be shared that show its unique performance capabilities and compatibility with higher scale power requirements. Features include; touch panel control, single and dual configurations, DC bias capability (with dual design), fastest pulse frequency available in the market, and scalable to higher power process requirements.