Combined Plasma and Layer Process Control System

PLASUS introduces its latest development to the North American and European market: the innovative combined plasma and layer process control system EMICON MC+LC. This system gives full control over the entire coating process by monitoring both plasma condition and produced layer simultaneously. The optical sensors for plasma monitoring as well as for layer controlling are located inside the vacuum chamber and are connected via optical fibers to the light detectors and light source in the EMICON system. This allows easy and cost efficient setups in any plasma application whether in R&D or production. All data from the plasma and the layer is acquired continuously in real time. The immediate and smart data analysis combines the plasma and layer measurements, checks for any process deviations and takes appropriate action using advanced control algorithms. Since process and product are analyzed simultaneously, full control of the entire production process is guaranteed and production deviations are compensated in real time by adjusting the appropriate parameters. Thus, production stability, product quality and machine uptime will benefit considerably. System setup is presented and machine integration will be discussed.