Optix - A novel wide range process gas monitor

Optix is a new wide range process gas monitor tool for detecting residual and contaminant gases as well as monitoring process gases in vacuum systems.  This monitor operates over a pressure range of 1x10e-6 to 5x10e-1 mbar without the need for differential pumping and is more sensitive to condensable gases, such as water vapor, than differentially pumped residual gas analyzers (RGA’s).  The Optix uses a spectrometer to measure the optical emission of gases from the process chamber which have been excited/ionized in a remote plasma generator connected directly to the chamber.  Qualitative and semi-quantitative information can be extracted from the emission data.  High atomic mass unit molecules can also be discerned as they are “cracked” in the plasma and have a specific emission signature.  Hydrocarbon gases can even be monitored to some extent.  Specific species can be tracked with time to provide process control and alarming.  The plasma generator can be easily cleaned in the case of heavy contamination and does not contain any filaments.