Surface Engineering Home      Exposition      To Register      ASM Homepage
Back to "Session 19: High Energy Photonic Processing for Surface Modification" Search
    Back to Main Search

Wednesday, August 4, 2004 - 3:10 PM
SES 19.5

Materials Response to Intense Ion Beams:

T. J. Renk, Sandia National Laboratories, Albuquerque, NM

Materials characterization, surface modification, and thin-film synthesis using pulsed intense ion beams are being investigated on the 800 kV RHEPP-1 facility at Sandia National Laboratories. Surface modification using rapid melt-resolidification cycles is possible in the fluence range 1-5 J/cm2, and ablation and thin-film synthesis can be achieved in the dose range of 5-10 J/ cm2. Surface modification effects include grain refinement, dispersal of second-phase particles, and surface alloying, and formation of metastable phases. Examples of surface modification include the incorporation of IFBA elements such as Gd and B into Zr, and mixing of Hf and other elements into Ti-6Al-4V to improve surface mechanical properties. Higher doses of nitrogen beams are being used to ablate and redeposit nanocrystalline thin films. Examples of this include deposition of high quality thin films Pt and Er and those of oxide superconductors such as BaTiO3 and YBCO.

Summary: The use of pulsed intense ion beams is being investigated for surface engineering applications and for synthesis of novel surface materials. Beams of 800 kV ions can modify materials to depths of 3 microns or more. Beams can also be used to ablate and redeposit material at high deposition rates.