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| Scanning Optical Microscopy (SOM) User Group | ||||
| Location: Meeting Room J1 (San Jose McEnery Convention Center) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: Scanning optical techniques are often employed for integrated circuit (IC) fault isolation and failure analysis. The challenges currently faced with SOM techniques include localization and resolution of defects deep within the device, spatial resolution limits and laser penetration into the die. Most IC’s are fabricated with many levels of metal and dielectric. Material systems range from aluminum or copper metallurgy to SiO2 or unique low k dielectrics. The objectives of this user’s group are to share general information from user’s and venders on how these issues are being dealt with, and to bring to light other critical issues currently hindering SOM-based FA. These and other important topics will be addressed in the meeting. Participants may make informal presentations using 4 – 5 slides.
All attendees are welcome. | ||||