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| Focused Ion Beam (FIB) User Group | ||||
| Location: Meeting Room J3 (San Jose McEnery Convention Center) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: What was once a research tool with a high “gee-whiz” factor is now an indispensable tool for Failure Analysts. From cross-sections to design edits/debugs, to making TEM samples to nanomanufacturing, the focused ion beam and dual beam tools are used from the wafer fab to the backend and beyond. This is an informal discussion on new techniques, recent accomplishments, challenges and problem resolution, and “wish lists.” Topics may include (but are not limited to) new gas chemistries, new in-situ tools, artifact reduction, 3-D reconstruction of images, and circuit edits for the new silicon technology nodes. Participants are encouraged to bring informal presentation materials, data, or visual examples to support the discussion.
All attendees are welcome. | ||||
| Session Chair: | Ms. Becky Holdford Texas Instruments, Dallas, TX | |||