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| Nano Probe User Group | ||||
| Location: Meeting Room J3 (San Jose McEnery Convention Center) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: As feature sizes on semiconductor devices continue to shrink, the technology of mechanical probing has evolved to meet the challenge. Recent advances include the use of piezoelectric motors with nanometer positioning accuracy and the replacement of optical imaging with either SEM or SPM. Even with mechanical probing at the 90 nm node, significant development issues remain, including contact resistance - reduction and measurement; probe drift and stability for long term measurements; force and contact feedback; and nanoprobing at advanced nodes – 65 nm and 45 nm. This is an informal discussion on recent accomplishments, challenges and problem resolution, and “wish lists.” Topics may include (but are not limited to) case studies, new or improved instrumentation, tip technology (diamond?), sample preparation and new applications. Participants are encouraged to bring informal presentation materials, data, or visual examples to support the discussion.
All attendees are welcome. | ||||
| Session Chair: | Mr. Edward Keyes Semiconductor Insights, Ottawa, ON, Canada | |||