C. Lin, No.3 Li-Hsin Rd. II , Science-Based Industrial Park, Hsin-Chu City,Taiwan 300, R.O.C., Hsin-CHu,Taiwan, Taiwan; S. S. Lu, National Taiwan University, Taipei, Taiwan, R.O.C, Taiwan; H. Zhang, Failure Analysis dept, Product Division, UMCi, Singapore, Hsinchu, Singapore

Summary: Conductive Atomic Force Microscopy (C-AFM) is an accurate and useful tool for both electrical failure analysis (EFA) and physical failure analysis (PFA).