M. B. Schmidt, L. A. Dworkin, FEI Company, Hillsboro, OR; C. Hess, M. Squcciarini, S. Yu, J. Burrows, PDF Solutions Inc., San Jose, CA

Summary: This paper discusses a new technique for localizing and determining the root cause of yield limiting defects detected after electrical test. The technique highlights the union between electrical test structure layout and FIB/SEM Dualbeam.