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Wednesday, November 17, 2010
11.3

Advanced IR-OBIRCH Analysis Technology for High Isb Failure Analysis

K. H. Chen, W. S. Wu, United Microelectronics Corporation, Ltd., Tainan County, Taiwan; J. C. Lin, United Microelectronics Corporation, Hsin-Chu, Taiwan; Y. H. Shu, United Microelectronics Corporation, Ltd., Hsinchu County, Taiwan

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Summary: IR –OBIRCH is a useful tool to do fault localization technique. But the real failure sites are not always at OBIRCH spot locations. This paper provides an example by combined some tools such as layout tracing, circuit repairing, micro probing, and etc. to confirm the real fail location