J. Kitamura, Fujimi incorporated, Kakamigahara, Japan; Z. Tang, C. Davidson, A. Burgess, Northwest Mettech Corp., North Vancouver, BC, Canada; H. Ibe, F. Yuasa, Fujimi Incorporated, Kakamigahara, Gifu, Japan
Yttrium oxide coatings have been prepared with high power axial injection plasma spraying using fine powder slurries. In order to understand basic coating properties, comparison of microstructure, porosity and hardness have been conducted among the high power suspension plasma spray coatings, high power plasma spray coatings prepared using conventional sized powder and coatings by conventional plasma spraying with the conventional powder. Erosion properties, the most important property for chamber shielding parts in dry etching equipments, have been also investigated against halogen containing plasma, widely used in the etching process of silicon electronic devices and flat panel display. This paper will describe the superiority of the suspension plasma spray coating of yttrium oxide in terms of high density, high hardness, high uniformity, high anti-plasma erosion resistance and retention of smooth surface after plasma erosion.
Summary: This paper will describe that the superiority of the suspension plasma spray coating of yttrium oxide in terms of high density, high hardness, high uniformity, high anti-plasma erosion resistance and retention of smooth surface after plasma erosion compared to yttrium oxide coatings
used in actual applications where conventional plasma spray equipments and powders are used for coating preparation. The suspension plasma spray coatings will have high potential to use as chamber shielding parts in the equipments of dry etching process for Si device and flat-panel-display production due to its high performance.
