Los Alamos and Oakridge National Labs laid the groundwork for development of the Ionic Fusion nanotechnology. The IPD technology eliminates many metallization problems and adds other advantages. The process impregnates metals, as well as multi-alloys, oxycarbonitrides, and noble metal combinations, into a wide variety of materials including ceramics, polymers, paper, quartz, metals and composites. The process uses a vacuum to remove all contaminants and to ensure a strictly controlled environment.The depositing ions are accelerated through magnetic devices to ensure that the depositing species are the correct energy for the desired substrate material. A broad range of custom stoichiometries are avilable.The process runs at ambient temperature unlike other deposition technologies and can also be controlled for particle size, density, and rate of dispersion resulting in porous nano textured structures for precise drug delivery or ultra dense barriers for radiopacity. In recent tests by NASA the metal ion penetration achieved a depth greater than 12 microns into a superalloy. Comparative studies at Los Alamos National and Oakridge National Labs tested 60 coating and plating technologies in the highly reactive RF environment for linear accelerators. The Ionic Fusion IPD process outperformed each technology in all areas tested. Materials can be applied in multi-layers with the correct mix of target components and excellent adhesion. The IPD process offers unprecedented high efficiency and cost effectiveness over traditional metallization processes. Ionic Fusion offers an AgxOy application that is anti-microbial. IPD materials are impregnated and will not crack or peel.