Material Solutions Home      Exposition      To Register      ASM Homepage
Back to "Session 1: Nano-, Electronic, and Optical Materials I" Search
  Back to "Frontiers of Materials Science & Engineering Symposium 2004: Bridging Science & Manufacturing" Search  Back to Main Search

Monday, October 18, 2004 - 11:00 AM
FRO 1.3

Performance of Crystals for AOTF Imaging: Parameters for Production and Quality Control

N. B. Singh, Northrop Grumman Corporation ES, Baltimore, MD; N. Gupta, U.S. Army Research Laboratory, Adelphi, MD; M. Gottlieb, D. Suhre, T. Waite, A. Berghmans, D. Kahler, A. Kirschenbaum, Northrop Grumman, Linthicum, MD

During the past decade many technologies for imaging have been developed. Materials maturity and development have played key roles in achieving the goals of these technologies. Northrop Grumman and the Army Research Laboratory have developed a variety of materials for acousto-optic imaging applications. For the infrared wavelength region, ternary materials such as thallium arsenic selenide, Tl3AsSe3 (TAS), and thallium arsenic sulfide, Tl3AsS4 (TASl) are very exciting materials. In this presentation we will present the critical parameters for the development, production and quality control of these materials.