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| Session 1: Nano-, Electronic, and Optical Materials I | ||||
| Location: C 211 (Greater Columbus Convention Center) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: Increasing demands of high power, high purity and high speed processing from the micro and nano scale devices have put an additional emphasis on materials research. It is very clear that material is the key to bring the revolution in each area whether it is imaging, spectral or signal processing system. This session provides excellent examples of materials, which have great potential to make tremendous impact on commercial and military systems. | ||||
| Session Chair: | Dr. N. B. Singh Northrop Grumman Corporation ES, Baltimore, MD | |||
| 10:00 AM | FRO 1.1 | INVITED: From Bulk and Thick-Film Sensors to Ceramic Nano-Structures | ||
| 10:30 AM | FRO 1.2 | INVITED: II-VI Opto-electronic Crystals and Their Novel Applications | ||
| 11:00 AM | FRO 1.3 | Performance of Crystals for AOTF Imaging: Parameters for Production and Quality Control | ||
| 11:30 AM | FRO 1.4 | INVITED: Transmission Electron Microscopy for Process Development, Manufacturing, and Failure Analysis of Semiconductor Devices | ||
| 12:00 PM | FRO 1.5 | Self-Assembly – Review and Applications | ||