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Tuesday, August 2, 2005
SES .16

Impact of Post-Deposition Annealing and Ion-Implantation of the Properties of CuIn0.75Ga0.25Se2 Thin Films

E. Ahmed, M. Amar, Manchester Metropolitan University, Manchester, United Kingdom; W. Ahmed, University of Ulster, Newtownabbey, United Kingdom; M. J. Jackson, Purdue University, West Lafayette, IN

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Summary: This poster explains post deposition annealing on the properties of copper based thin films.