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Tuesday, August 2, 2005
SES .5

Characterization of Reactively Sputtered Ti-Si-N Films

S. You, B. Johnson, J. Sun, M. J. O’Keefe, University of Missouri-Rolla, Rolla, MO

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Summary: All Ti-Si-N films produced by r.f. magnetron sputtering were found to be amorphous. The chemical bonding state of the films played a critical role in the resistivity, microstructure and microhardness of the films. The Si3N4 bonding content in the films could be controlled by adjusting N2 partial pressure in the sputtering gas.