S. You, B. Johnson, J. Sun, M. J. O’Keefe, University of Missouri-Rolla, Rolla, MO
Summary: All Ti-Si-N films produced by r.f. magnetron sputtering were found to be amorphous. The chemical bonding state of the films played a critical role in the resistivity, microstructure and microhardness of the films. The Si3N4 bonding content in the films could be controlled by adjusting N2 partial pressure in the sputtering gas.