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ISEC1: Industrial PVD/CVD | ||||
Location: Governors V (Radisson Riverfront Hotel) | ||||
(Please check final room assignments on-site). | ||||
Session Description: The Physical Vapor Deposition [PVD] and the Chemical Vapor Deposition [CVD] processes are at the forefront of surface engineering technologies owing to their wide-ranging commercial applications and environmental friendliness. The thin films and coatings produced via these processes are providing surface enhancements in tribological applications, oxidation and corrosion resistance, thermal management, decorative applications and various other functional requirements, such as photovoltaic, optical, semiconductor, fuel-cell devices, etc. This session addresses a wide range of coatings research and process development efforts such as advanced deposition techniques using pulsed plasma, ion-assisted plasma, filtered-arc, etc. to produce high performance metallic, ceramic, polymeric, cermet and functionally graded films. In addition, novel testing methods, materials characterization, and deposition equipment design and improvement will be discussed. Specific issues to be addressed include high efficiency/low cost methods of coating deposition and surface modification, micro- and nano-structural assessment of coating processes, predictive modeling of deposition experiments and resulting surface characteristics, and testing methods which simulate various conditions that PVD/CVD applied coatings. Emphasis will be placed on industrial experience and research needs in PVD/CVD technologies. | ||||
Editor: | Prof. Mark J. Jackson Purdue University, West Lafayette, IN | |||
Session Chair: | Dr. Nasar Ali University of Aveiro, Aveiro, Portugal | |||
8:45 AM | SES .1 | Pulsed Magnetron Sputtering of Powder Targets: a New Development Tool for Multi-Component Coatings | ||
9:15 AM | TBD | |||
9:45 AM | Break | |||
10:00 AM | SES .2 | Corrosion in Lead | ||
10:30 AM | SES .3 | Tribological Behavior of Hard Coatings Sliding against Epoxy Molding |