Fabrication and Characterization of Sputtered NiTi and Titanium Thin Films with 3D Functionalities

Tuesday, May 5, 2026: 5:05 PM
Mr. Lars Bumke , Acquandas GmbH, Kiel, Germany
Dr. Christoph Chluba , Acquandas GmbH, Kiel, Germany
Dr. Christoph Bechtold , Acquandas GmbH, Kiel, Germany
Mr. Gerd Siekmeyer , Acquandas GmbH, Kiel, Germany
Dr. Rodrigo Lima de Miranda , Acquandas GmbH, Kiel, Germany
Nickel–titanium (NiTi) and titanium thin films fabricated by magnetron sputtering in combination with microsystems technology offer new possibilities for miniaturized components with well-defined geometry and functional properties. Using a combination of several microsystems technology processes, freestanding metallic microstructures can be produced with high precision and reproducibility.

Recent process developments enable the formation of three-dimensional geometrical features, such as locally shaped or non-planar thin films, extending the design space for functional microcomponents. The mechanical behavior, surface morphology, and microstructure of these films were systematically investigated to establish process–structure–property relationships relevant to reliable device design.

Results show that sputtered NiTi thin films exhibit the characteristic superelastic and shape-memory behavior of the bulk material while maintaining smooth surfaces and tight dimensional tolerances. The combination of sputtering, photolithography, and selective etching allows for the controlled fabrication of complex geometries suitable for applications such as membranes, implants, bioelectronic devices and micro-mechanical actuators.

This work demonstrates that thin-film fabrication methods can be applied to create scalable, mechanically robust metallic microcomponents with customized functional responses for advanced technical and biomedical applications.