Inspired from telecommunication amplifiers to plasma power supplies

Layers for solar cell manufacturing, display technology and semiconductor production require precise and efficient PVD and PECVD coatings as well as plasma etching processes. There is a trend to higher frequencies for this plasma applications to increase the productivity or even allow new applications. Depending on the application also a variety of different power levels is needed. These requirements has led us to develop and bring to market a new approach for the architecture of plasma generators designed in a platform approach. Inspired by telecommunications industry we adapted their technologies for the industrial plasma power supplies. The latest generation of LDMOS-transistors, amplifier classes and envelope tracking from transmitter base station also well fulfill the stringent ruggedness requirements of plasma applications. The sophisticated planar PCB design from mobile phones is adjusted in terms of higher power level and frequency and brings the advantages and experience from high volume production to the industrial power supply. The here presented new platform concept can be adapted to different HF/VHF-frequencies and power levels of up to 40 kW. Together with the established TRUMPF Huettinger power combining topology which enables cable independence as well as high plasma stability and a completely new metrology system this amplifier development impressively shows the change from piece manufacturing to a highly industrialized and reproducible production leading to rugged and repeatable high-end products.