Plasma-surface interactions in atmospheric pressure plasmas: In situ measurements of local excitations in thin films

Wednesday, May 3, 2017: 8:30 AM
553AB (Rhode Island Convention Center)
S.G. Walton , Naval Research Laboratory, Washington, DC
B.M. Foley , University of Virginia, Charlottesville, VA
J. Tomko , University of Virginia, Charlottesville, VA
D.R. Boris , Naval Research Laboratory, Washington, DC
E.D. Gillman , Naval Research Laboratory, Washington, DC
S.C. Hernández , Naval Research Laboratory, Washington, DC
A. Giri , University of Virginia, Charlottesville, VA
Tz. B Petrova , Naval Research Laboratory, Washington, DC
G.M. Petrov , Naval Research Laboratory, Washington, DC
P.E. Hopkins , University of Virginia, Charlottesville, VA
The energy flux to a surface during plasma exposure and the associated surface heating are of long standing interest as they contribute to the physicochemical changes associated plasma-based materials processing. The unique feature of plasmas compared to other methods of materials synthesis and processing is that the energy flux is delivered and absorbed at or very near the surface over short time scales, and thus requires fast, surface-sensitive techniques to fully understand the dynamics of the plasma-surface interface. In this work, we employ pump-probe Time-Domain Thermoreflectance (TDTR) to measure the electron and phonon excitation and energy transport dynamics in thin metal films during exposure to an atmospheric pressure plasma jet. The results show the energy delivered by the plasma jet causes a localized thermal spike, which raises the kinetic energy of the electrons at the point of contact. That energy is then dissipated through electron-electron collisions and electron-phonon interactions as the electrons propagate radially from the impact zone. These results, in conjunction with plasma characterization, will be discussed in an effort to develop a first order understanding of energy transfer and relevant kinetics during plasma jet–surface interactions. This work is partially supported by the Naval Research Laboratory base program.
See more of: Plasma Processing II
See more of: Oral Technical Sessions