Plasma Processing II

Wednesday, May 3, 2017: 8:30 AM-11:00 AM
553AB (Rhode Island Convention Center)
Lenka Zajickova, Masaryk University
8:30 AM
Plasma-surface interactions in atmospheric pressure plasmas: In situ measurements of local excitations in thin films
S.G. Walton, Naval Research Laboratory; B.M. Foley, University of Virginia; J. Tomko, University of Virginia; D.R. Boris, Naval Research Laboratory; E.D. Gillman, Naval Research Laboratory; S.C. Hernández, Naval Research Laboratory; A. Giri, University of Virginia; Tz. B Petrova, Naval Research Laboratory; G.M. Petrov, Naval Research Laboratory; P.E. Hopkins, University of Virginia
8:50 AM
Monitoring and control of vacuum processes using a remote plasma emission spectroscopy based sensor
J. Brindley, Gencoa Ltd; Frank Papa, Gencoa USA; Benoit Daniel, Gencoa Ltd; Victor Bellido-Gonzalez, Gencoa Ltd
9:10 AM
Advantages of Waveform Adaptability in Low Frequency PECVD Applications
Wojciech Gajewski, TRUMPF Huettinger Sp. z o.o.; Krzysztof Ruda, TRUMPF Huettinger Sp. z o.o.; Jakub Swiatnicki, TRUMPF Huettinger Sp. z o.o.; Pawel Ozimek, TRUMPF Huettinger Sp. z o.o.
9:30 AM
9:40 AM
10:20 AM
Low Temperature Plasma-Assisted Atomic Layer Epitaxy of III-V Nitride Semiconductors
Neeraj Nepal, U.S. Naval Research Laboratory; V.R. Anderson, U.S. Naval Research Laboratory; J.K. Hite, U.S. Naval Research Laboratory; N.A. Mahadik, U.S. Naval Research Laboratory; S.B. Qadri, U.S. Naval Research Laboratory; L.O. Nyakiti, Texas A&M University; M.J. Mehl, US Naval Academy; V.D. Wheeler, U.S. Naval Research Laboratory; D.J. Meyer, U.S. Naval Research Laboratory; B.P. Downey, U.S. Naval Research Laboratory; M.A. Mastro, U.S. Naval Research Laboratory; C.R. Eddy Jr., U.S. Naval Research Laboratory