Ralf Bandorf

Head of Group
Fraunhofer IST
Highl Ionized Plasmas and PECVD
Braunschweig Germany 38108

Papers:

Process transfer from R&D to small industrial cathode
Controlling the ion to neutral ratio by measuring the plasma emission in a non-reactive HIPIMS process
Advanced HIPIMS solution for R&D and Process Development
Micro-structure investigations on gas flow sputtered thermal barrier coatings