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Thursday, November 18, 2004 - 1:30 PM
23.3

A Correlation Study Between XPS and AES Quantitative Analysis of Nitrogen Concentration in Gate Oxide

M. Li, Semicoductor Manufacturing International Co., Shanghai, China; L. Wu, C. Niou, Semiconductor Manufacturing International (Beijing) Corp, Beijing, China; J. Lee, J. Zhou, Semiconductor Manufacturing International Corperation, Shanghai, China; W. T. K. Chien, Semiconductor Manufacturing International Company, Shanghai, China; Q. Gao, Semiconductor Manufacturing International Corporation, Shanghai, China

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