A Novel Approach of Identifying Silicon Defects Using Passive Voltage Contrast Techniques, Leading to Utilization of In-Line SEM Based Voltage Contrast Inspections to Drive Closed Loop Process Optimization and Defect Ellimination
R. Fredrickson, R. Young, J. Cournoyer, LSI Logic, Gresham, OR; M. B. Schmidt, FEI Company, Hillsboro, OR
