OBIRCH driven Failure Analysis for Process Development of 120 nm to 65 nm technology nodes
R. Ross, K. Ly, Freescale Semiconductor, Crolles, France; M. De la Bardonnie, L. Kwakman, Philips Semiconductors, Crolles, France; M. Lamy, F. Lorut, STMicroelectronics, Crolles, France; C. Wyon, CEA-LETI, Grenoble, France
