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| Session 22: Optical Techniques 2 | ||||
| Location: North Ballroom (Worcester's Centrum Centre) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: Optical techniques have expanded in recent years to cover a range of capabilities from locating hard failures to waveform extraction. The constant evolution of IC technology to smaller feature size and new materials places constant stress on the limits of optical techniques. Laser thermal induced and thermal mapping techniques are presented. | ||||
| Editors: | James Cargo Agere Systems, Allentown, PA Mr. Stanley Swieck Analog Devices, Wilmington, MA Mr. Michael Eskenazi Qualcomm Corporation, San Diego, CA Felix Beaudoin IBM Mr. Ted Hasegawa National Semiconductor, Santa Clara, CA Mr. David Vallett IBM Systems and Technology Group, Essex Jct., VT Dr. Aaron Falk OptoMetrix, Inc, Renton, WA | |||
| Session Chair: | Dr. Aaron Falk OptoMetrix, Inc, Renton, WA | |||
| 10:25 AM | 22.1 | OBIRCH driven Failure Analysis for Process Development of 120 nm to 65 nm technology nodes | ||
| 10:50 AM | 22.2 | Enhanced Pixel by Pixel Emissivity Correction for Thermal Microscopy | ||
| 11:15 AM | Lunch | |||