Focused Ion Beam (FIB)systems have been a boon to the semiconductor industry in the last decade. With their flexibility, these systems can be used in the analytical and device edit modes, as easily and quickly as you can change the samples inside the chamber. This tutorial will discuss hands on applications using the FIB systems for device edits and analytical functions. Analytical capabilities are further divided into preparing samples for SEM and TEM analysis. Si and compound III-V materials will be discussed.