Rapidly decreasing feature sizes in micro- and nano-electronic devices demand ever higher resolution microscopy tools. The scanning electron microscope (SEM) remains one of the most flexible tools for high resolution imaging. Modern field emission scanning electron microscopes have a nominal spot size as small as 1 nm, but 1 nm resolution is seldom achieved on ordinary samples due to limitations with beam-sample interactions. The limitations on resolution in the SEM will be discussed, and two methods will be presented which overcome these limitations and enable ultra-high resolution: STEM-in-SEM and low-loss imaging.