Effect of the Ash Chemistries on the TDDB Lifetime of the Cu/ULK Dielectrics
D. H. Su, Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, Taiwan; L. C. Chen, J. L. Yang, R. L. Huang, J. S. Tsai, J. H. Shieh, S. M. Jang, M. S. Liang, TSMC, Hsinchu, Taiwan; J. B. Lai, R. Huang, Taiwan Semiconductor Manufacturing Company, Hsinchu, Taiwan
