J. Colvin, FA Instruments, San Jose, CA; A. Erickson, Multiprobe, Inc., Santa Barbara, CA
The Scanning Probe Microscope (SPM) has become an indispensable tool for failure analysis and FAB process characterization. The SPM more commonly known as the Atomic Force Microscope (AFM) can do much more than just image a surface. Interest in SPM for FA is increasing due to new AFM technologies and broader exposure to semiconductor applications information, primarily from wafer process measurements. These technologies include scanning capacitance, thermal, current and voltage microscopies (SCM, STHM, EFM, SKPM, CAFM) as well as more recent availability of microscopes that allow access for measurements on operating, packaged devices.