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Wednesday, November 9, 2005
SYMP0512.16

Gate Oxide Defect Localization and Analysis by Using Conductive Atomic Force Microscopy

Z. H. Lee, C. J. Lin, Taiwan Semiconductor Manufacture Company, Ltd., Taiwan, Tainan, Taiwan; S. W. Lai, J. H. Chou, Taiwan Semiconductor Manufacture Company, Ltd., Taiwan, Shan-Hua Tainan, Taiwan

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