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Tuesday, November 8, 2005 - 11:50 AM
SYMP053.6

The Effectiveness of OBIRCH Based Fault Isolation for Sub-90 nm CMOS technologies

M. De la Bardonnie, L. Kwakman, Philips Semiconductors, Crolles, France; R. Ross, K. Ly, Freescale Semiconductor, Crolles, France; F. Lorut, M. Lamy, STMicroelectronics, Crolles, France; C. Wyon, CEA-LETI, Grenoble, France; Y. HIRUMA, Hamamatsu Photonics K. K., Hamamatsu city, Japan; J. ROUX, Hamamatsu France, Meylan, France

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