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| Session 18: Nanotechnology Analysis | ||||
| Location: Meeting Room J3 (San Jose McEnery Convention Center) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: Technology advancements into the nanoscale regime have given way to a plethora of challenges from an analytical standpoint. The development of novel analytical techniques is critical in order to facilitate a good understanding of these nanostructures. In some instances, current microanalysis techniques can be extended for nanoanalysis. One topic presented in this session describes the extension of current Scanning Electron Microscopy X-ray analysis to the nanoscale by using a lower accelerating voltage. Strain in nanoscale structures is a key parameter to understand and a method of nanoscale strain determination is another topic that will be covered. Also included in this session is a technique for performing three dimensional elemental nanoanalysis using a Focused Ion Beam/Scanning Transmission Electron Microscope. | ||||
| Editors: | Dr. James Slinkman IBM Microelectronics, Essex Junction Dr. Peter Harris Multiprobe, Inc, Santa Barbara, CA | |||
| Session Chair: | Dr. Paiboon Tangyunyong Sandia National Laboratories, Albuquerque, NM | |||
| 8:00 AM | SYMP0517.2 | X-Ray Nanoanalysis in the SEM | ||
| 8:25 AM | SYMP0517.3 | Kinematical Simulation of HOLZ Pattern for [110] Uniaxial Strain Determination | ||
| 8:50 AM | SYMP0517.4 | 3D Observation of Elemental Distribution of Si-Device using a Dedicated FIB/STEM System | ||