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Session 18: Nanotechnology Analysis
Location: Meeting Room J3 (San Jose McEnery Convention Center)
(Please check final room assignments on-site).
Session Description: Technology advancements into the nanoscale regime have given way to a plethora of challenges from an analytical standpoint. The development of novel analytical techniques is critical in order to facilitate a good understanding of these nanostructures. In some instances, current microanalysis techniques can be extended for nanoanalysis. One topic presented in this session describes the extension of current Scanning Electron Microscopy X-ray analysis to the nanoscale by using a lower accelerating voltage. Strain in nanoscale structures is a key parameter to understand and a method of nanoscale strain determination is another topic that will be covered. Also included in this session is a technique for performing three dimensional elemental nanoanalysis using a Focused Ion Beam/Scanning Transmission Electron Microscope.

Editors:Dr. James Slinkman IBM Microelectronics, Essex Junction
Dr. Peter Harris Multiprobe, Inc, Santa Barbara, CA
Session Chair:Dr. Paiboon Tangyunyong Sandia National Laboratories, Albuquerque, NM
8:00 AMX-Ray Nanoanalysis in the SEM
8:25 AMKinematical Simulation of HOLZ Pattern for [110] Uniaxial Strain Determination
8:50 AM3D Observation of Elemental Distribution of Si-Device using a Dedicated FIB/STEM System