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Wednesday, November 7, 2007 - 4:00 PM

Studies of Galvanic Corrosion (Al-Ti Cell) on Microchip Al Bondpads and Elimination Solutions

Y. N. Hua, GLOBALFOUNDRIES Singapore Pte Ltd, Singapore, Singapore; S. P. Zhao, Chartered Semiconductor Mfg Ltd., Singapore, Singapore; A. Trigg, Institute of Microelectronics, Singapore, Singapore

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Summary: In this paper, a concept and theoretical model of galvanic corrosion (Al-Ti cell) will be proposed originally, which can help us to understand physically & chemically mechanism of galvanic corrosion at bondpad edge, and allow us to eliminate it to reduce NSOP (non-stick on pads) issue at assembly processes