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Thursday, November 8, 2007 - 11:50 AM

Photo Process Margin Leading To IC Failures- A case Study

V. Chowdhury, C. Hsu, A. Yu, Altera Corp., San Jose, CA

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Summary: Subtle read disturb failures seen on several lots and products had a pattern specific failure. A thorough layout analysis followed by nanoprobing confirmed the failure to be specific to certain transitors with a poor performance. The uniqueness of the layout made the failing rows and columns more vulnerable to this failure. A correlation done with the impact lots confirmed the failures due to a bad tool. The column and row failures were ascribed to blocked NLDD and pocket implant